In order to pass this subject, the students must show that they... (Passing this subject, the students achieve the following results...)
1. Possess a critical view of the different chemical and physical methods for the preparation of nanostructured materials, identifying the pros and cons of each method in accordance with the material type with which they are going to work.
2. Identify and correlate the unique features of the original materials, the preparation technique used and the end nature and properties of the nanostructures obtained.
3. Assess the practical difficulties involved in the manufacturing of nanostructured materials, developing the ability to design strategies to solve them and being able to choose the most appropriate approach in each case.
4. The student is able to plan, design and perform experiments that allow value added nanomaterials to be produced, assessing the problems, risks and results.
A brief introduction to the subject
The two types of approach used for the production of nanostructured materials are presented in this subject, i.e. the "top-down" method which consists of "sculpting" a macro or micro material until obtaining the nanoscopic dimensions required, and the "bottom-up" method in which the atoms and molecules are moved like "bricks" to create a nanoscopic molecular building.
A brief description of the contents of this subject includes:
Presentation of the nanostructured materials preparation methods: "top-down" and "bottom-up" approaches. Preparation methods for thin film, single and multi-layer molecules: chemical vapour deposition (CVD), physical vapour deposition (PVD), liquid phase deposition (“cast films”, “spin coating”, “spray coating”, “ink printing”, “dip-coating”, “layer-by-layer”, Langmuir-Blodgett, liquid phase epitaxy, electroplating, etc.), solid phase deposition (“powder deposition”, “screen printing”). Optical lithography. Electron beam lithography. Ion beam lithography. Evanescent wave lithography. Nanoimprint lithography.
The theory classes are complemented by four practical sessions including:
1.- Liquid phase deposition techniques
2.- Optical lithography
3.- PLD Sputtering